Applying CMOS capabilities of CEITEC´s foundry towards silicon photonic devices

This manuscript presents preliminary results of the development of processes for manufacturing of photonics devices using SU-8, silicon nitride and silicon dioxide using a high-volume CMOS foundry process. Preliminary results for photonic devices based on polymer inverted-rib waveguides are also presented. The CEITEC S.A facilities were used to fabricate the 150 mm wafers. Photomask design and manufacturing, as well as wafer post-processing were carried out at CTI. A summary of the processes, the polymer inverted-rib waveguide device processing and characterization, as well some preliminary optical results are presented. Spectral filters with free spectral range (FSR) of about 1 nm are demonstrated.