Electrodeposition of anisotropic NiFe thin films for integrated high-frequency micro-inductor

NiFe thin films were fabricated on wafer by applying 100mT external magnetic field during electroplating, and the function of in-plane parallel magnetic field in the course of the plating experiment and magnetic properties have been studied in this paper. Magnetic measurements show that in-plane anisotropy field can be obtained by magnet-electroplating, and the magnetic properties are very sensitive to the thickness of film. The Ni70Fe30 film with thickness of both 0.6μm and 1.2μm exhibit significantly uniaxial surface anisotropy and the complex permeability of the direction of parallel magnetic field can reach about 220 while 2μm NiFe thin film does not have a uniaxial magnetic anisotropy. The results also show that the ferromagnetic-resonance frequency(FMR) can run up to 500Mz when the thickness is suitable, which is an essential performance in the design of micro-inductor devices.