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Colloidal silica: Chemistry, properties and adaptations for electronic polishing applications | IEEE Conference Publication | IEEE Xplore

Colloidal silica: Chemistry, properties and adaptations for electronic polishing applications


Abstract:

Colloidal silica products are stable dispersions of non-agglomerated, amorphous, nanometer-size, and spherical particles of silica. The good stability, adjustable particl...Show More

Abstract:

Colloidal silica products are stable dispersions of non-agglomerated, amorphous, nanometer-size, and spherical particles of silica. The good stability, adjustable particle size distribution and mechanical properties have made colloidal silica a preferred abrasive for many CMP applications. Recently, research and analytical efforts have focused on the development of colloidal products with tunable physical and chemical properties to open up new opportunities in the CMP industry segment.
Date of Conference: 11-12 March 2018
Date Added to IEEE Xplore: 31 May 2018
ISBN Information:
Conference Location: Shanghai, China

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