An intra-laboratory investigation of on-wafer measurement reproducibility at millimeter-wave frequencies

Understanding the relative contribution of contact repeatability and overall reproducibility for on-wafer measurements provides useful insight into the significance of measurement comparisons. We report on an intra-laboratory investigation into contact repeatability and the variation that may be anticipated when measurements are reproduced in different laboratories using different equipment. We pay particular attention to the dispersion in measurement results arising from the use of on-wafer and off-wafer calibration. Experimental results are reported for measurements in the frequency range 140 GHz to 220 GHz, together with preliminary estimates of the repeatability limits for this type of measurement.