Simultaneous ion beam deposition of positive and negative ions for the production of Au-N systems

A new material production method, using ion beam deposition (IBD), has been applied for the simultaneous deposition of positive and negative ions of a variety of materials. This method combines the use of clean ion sources with mass-analyzed ion beams under ultra-high-vacuum conditions, to allow the production of ultra clean materials. Studies were performed in order to clarify the composition and morphology of Au films produced by the deposition of negative Au simultaneously with positive N ions on glassy C substrates. Depositions were made with different ion beam energies, to study the influence of energy on the composition of the films. Analyses were preformed with X-ray photoelectron spectroscopy and high resolution scanning electron microscopy.