High-speed scanning system for large ion beams

Single wafer processing high current ion implanter is one of the leading candidates for the new generation semiconductor and LCD manufacturing line-up. As its key-technology, ULVAC has developed a high-speed scanning system by which a large ion beam as high as 25 mA is scanned at high speed more than 100 Hz. The principle of scanning and the reduction of non-uniformity such as space charge effect and/or deflection aberration will be discussed.