A compact ion implanter for R&D use: UP-150

As the wafer size becomes larger, initial and/or maintenance costs of semiconductor processing equipment are increased. For research and development use with high flexibility and low cost, a compact ion implanter, the UP-series, has been developed. The ion beam optics of UP-150, which is the basic model of this series, is designed in order to reduce not only the footprint but also the number of the composite parts. The design principle that realizes high quality implantation with minimum resources and the performance will be discussed.