A technique for the production of multiple, large, mass analysed ribbon ion beams

An ion source for the production of very uniform multiple ribbon beams combined with a mass analysis technique giving mass analysis of beams of any size or number leads to a machine technology capable of producing extremely high current, but low current density, ion beams. Low energy mass analysed implants up to 100 mA, Flat Panel Display implants with extremely large multiple beams and multi-amp oxygen implants will be possible with this new technology.