Fabrication of nanoscale features on ultra-thin glass-based dielectrics via self-masking and preferential etching to enhance capacitance

Flexible capacitors based on ultra-thin glass (30 μm thick) were fabricated and the effect of nanoscale surface modification on the dielectric properties was studied. The ultra-thin glass samples were partially masked by the deposition and self-organisation of Ag-islands and then preferentially etched to produce a controlled topography. The etching duration was varied and its effect on Ag content and dielectric properties were studied by employing atomic force microscopy (AFM), scanning electron microscopy and energy-dispersive X-ray spectroscopy (SEM-EDS), and impedance spectroscopy. The AFM studies revealed the presence of nanoscale `peaks', which were distributed across the surface of the glass, that following etching showed enhanced capacitance. Surface modification of glass using self-organised nano-scale metal island masks is shown to be an effective route to enhance the use of ultra-thin glass in capacitor applications.