Lithography in a 300 mm pilot production line

This paper discusses the performance of the initial 300 mm lithography tool set installed in a pilot line in Dresden, Germany. The product used for evaluating and debugging the tool set is a 0.25-micron ground rule 64 M DRAM. This was chosen for the ability to benchmark against 200 mm DRAM manufacturing data. We have produced several lots of wafers with measurable yield. These lots have produced data on overlay, CD and run to run performance of the lithography tools on actual products.