Studies of TEM/EDX data process and application in identification of Cu oxide compounds

TEM/EDX analysis techniques are widely used in failure analysis. Based on TEM results, one can know the structures of the sample e.g. in anomalous or crystalline, as well as the thickness of the thin film layer. Typically, TEM/EDX results can only provide the elemental information of the sample. In this paper, we discussed a standardless EDX analysis method to identify the chemical state composition for an unknown sample. Generally, it is to use the atomic percentage W
_i
^a'
(excluding Pt from the sample preparation), which can be easily achieved by a certain data processing, to identify the chemical state composition. For example, in this paper, we studied the layers composition on Cu substrate, which was consisting of CuO and Cu
₂
O.