Nanofabrication Techniques for Chipless RFID Sensors

This chapter first presents an overview of various fabrication techniques that can be used for the development of various chipless radio‐frequency identification (RFID) sensors. It then reviews innovative micro‐ and nanofabrication technologies suitable for roll‐to‐roll chipless RFID sensor printing. Next, the chapter highlights the limitations of conventional fabrication processes and provides industrial solutions for on‐demand, high‐speed printing for flexible, robust, mass productivity of chipless RFID sensor. The state‐of‐the‐art micro‐/nanofabrication processes that can be used to develop the chipless RFID sensor are electrodeposition, physical and chemical vapor deposition, laser ablation and direct pattern writing by photolithography/electron beam lithography (EBL)/ion beam lithography. The nanofabrication processes also include nanoimprint lithography (NIL) and etching, material modification by ion implantation, diffusion, doping, and thermal annealing. Finally, the chapter gives a general survey and comparison of the different fabrication techniques.