Highly manufacturable 7nm FinFET technology featuring EUV lithography for low power and high performance applications

7nm CMOS FinFET technology featuring EUV lithography, 4
^th
gen. dual Fin and 2
^nd
gen. multi-eWF gate stack is presented, providing 20% faster speed or consuming 35% less total power over 10nm technology [1]. EUV lithography, fully applied to MOL contacts and minimum-pitched metal/via interconnects, can reduce >25% mask steps with higher fidelity and smaller CD variation. A
VT
of 6T HD SRAM cell are 1.29 for PD (PG) and 1.34 for PU, respectively.