MEMS GYRO comb-shaped drive with enlarged capacity gradient

In this paper, we consider a technique for increasing the aspect ratio (AR) of an electrostatic comb drive structure of a microelectromechanical system, which is fabricated with the bulk microstructuring technology. The technical solution is described, which allows increasing the electrical capacity of driving and measuring comb structures, reducing the duration of plasma etching and increasing AR of various MEMS devices. The novel design of the comb drive improves the diffusion of the active plasma components into the dedicated cavities. This leads to an increase of the maximum achievable etching depth while maintaining a minimum gap between the teeth in the order of one micrometer.