Residue defect study on amorphous silicon film

In advanced technology nodes, many new materials have been introduced to improve the device capability. This means new particle sources are also introduced through more complicated process. Hence, the defect control will be more important for manufacturing and yield improvement. In this paper we addressed one type of residue defect found on surface of amorphous silicon film. The defect source and forming mechanism were revealed by our experiments. Finally, the cleaning method was shared that can remove this defect.