Self-organization effects during sputter deposition under quasi-equilibrium condensation conditions

The technological approach for fabrication of low-dimensional metallic structures of various selective architecture types which is based on quasi-equilibrium steady-state condensation of ion-sputtered substance is described. Corresponding structure growth forms and mechanisms are summarized from experimental results. Interdependent dissipative self-organization of low supersaturation and conservative self-organization of structures on a substrate are supposed to be responsible for selective growth of layers by means of the offered technological approach. Investigation of new technological systems of the type “active ambient - condensate” operating under ultra-clean vacuum conditions is expected. Using different active ambients such as plasma together with reactive gases in order to stimulate proximity to equilibrium are supposed. Estimation of critical binding energy is expected to enhance controllable selectivity of growth. Fully self-organized deposition systems are expected to serve as a tool for reproducible selective condensation of wide spectrum of 3D low-dimensional structures of weakly volatile materials.