Characterization of polycrystalline TlBr films for radiographic detectors

Vapor deposited films of thallium bromide are evaluated as potential photoconductive layers in new large-area radiographic detectors. The attractiveness of the material lies in its inherent high effective atomic number and high density. Polycrystalline films up to 200 /spl mu/m have been grown and show a columnar structure with grains reaching 100 /spl mu/m in diameter. Current-voltage (IV) tests indicate a bulk resistivity of 10/sup 9/-10/sup 10/ /spl Omega//spl middot/cm, limited by ionic conduction. The instability of current with time is also observed, but it can be minimized with cooling. The films demonstrate high gain at relatively low field strengths as compared to other photoconductive layers. Benefits and drawbacks of TIBr are compared to other materials, and possible solutions are discussed.