Demonstration of aluminum doped ZnO as anti-reflection coating

Here we demonstrate use of conductive Aluminum doped Zinc Oxide, Al:ZnO (AZO) layers as anti-reflective coating (ARC) for thin film a-Si and c-Si solar cells. Low temperature Atomic Layer Deposition is used for AZO growth. We report complex refractive index of AZO layers and performance of fabricated cells: AZO/100 nm a-Si and AZO/ 2 μm c-Si using ~73 nm AZO ARC. The current density measured for fabricated AZO/a-Si was 5.1 mA/cm
²
and AZO/c-Si 19.72 mA/cm
²
. 73 nm AZO completely minimizes reflection at 600 nm wavelength for c-Si cell.