Evaluation of radiation damaged p-in-n and n-in-n silicon microstrip detectors

Two p-in-n and one n-in-n silicon microstrip detectors were radiation-damaged and beam tested. Comparison was made for the p-in-n and the n-in-n in high resistivity wafers, and the p-inn in a low and a high resistivity wafer. The charge collection showed a clear difference in the n-in-n and the p-in-n detectors, which suggested that the charge signals were split into strips in the p-in-n detectors. Although a difference of the low and the high resistivity wafers was observed in the body capacitance measurement, little difference was observed in the beamtest results.