Fabrication of 200 mm Germanium-On-Insulator (GeOI): A step toward a Germanium photonic platform

Using the Smart Cut
^TM
technology, we fabricated 200 mm optical Germanium-On-Insulator (GeOI) substrates for photonic applications. The high crystalline quality of the Ge layer opens the way to wafer-scale fabrication of photonic components such as new light emitting devices based on highly-tensile strain.