Light Trapping in Micromorph Cell by Imprinting Self-Cleaning Dual-Scale Textured Coating

By combining photolithography microfabrication with electrochemical anodization nanotechnology, a dual-scale texture consisting of micro hemispherical pit arrays and nano pores was fabricated for light management. Compared with single-nano or single-micro textures, the dual-scale texture exhibited a stronger and broader band light-tapping property in both numerical simulation and experimental measurement. Due to its higher roughness, it also enjoyed an excellent self-cleaning performance (contact angle ~132°). Via imprinting the dual-scale texture onto the front glass surface of micromorph cell, the number of trapped photons and their optical path length in the active layer was both increased, thereby achieving an overall efficiency of 11.15% out of the bare device of 10.71%, resulting in 4.1% enhancement. This low-cost and facile approach is promising for developing high-performance optoelectronic devices in industrial scale.