Nano-pyramid arrays for nano-particle trapping

In this paper we present the drastic miniaturization of nano-wire pyramids fabricated by corner lithography. A particle trapping device was fabricated in a well-defined and symmetrical array. The entrance and exit hole-size can be tuned by adjusting fabrication parameters. We describe here in detail the effect of the corner lithography over-etch factor on side-aperture size and shape. To show the trapping functionality, 150 nm gold nano-particles trapping was demonstrated and the device with trapped particles was imaged by Scanning Electron Microscopy (SEM).