Silicon nanowire array fabricated with good site and size controllability

Effective and universal method to fabricate site well-defined, ordered, and homogenous size SiNWs is still necessary to support SiNWs application. In this paper, a simple and cost-effective approach to synthesis site and size controlled amorphous silicon nanowires (a-SiNWs) is reported. The position of a-SiNWs array can be simply controlled by the site of micron size Cu patterns array through photolithography. While the size of a-SiNWs can be adjust by the volume of Cu pattern.