Silicon-on-silicon rib waveguides with a high-confining ion-implanted lower cladding

The realization of single-mode rib waveguides in standard epitaxial silicon layer on lightly doped silicon substrate, using ion implantation to form the lower cladding, is reported. The implanted buffer layer enhances' the vertical confinement and improves the propagation characteristics. Respect to similar standard all-silicon waveguides a propagation loss reduction of about 7 dB/cm, in the single-mode regime, has been measured. A numerical analysis has been performed to evaluate the theoretical attenuation and the transverse optical field profiles. As a result of the presence of the ion implanted buffer layer, an increase of the fundamental mode confinement factor from 0.3 to 0.85 has been calculated. This results in a great enhancement of the coupling efficiency with standard single-mode optical fibers. Moreover, the proposed technique is low cost, fully compatible with standard VLSI processes, and allows a great flexibility in the integration of guided-wave devices and electronic circuits. Finally, the very high thermal conductivity characterizing these waveguides makes them attractive host-structures for electrically and thermally controlled active optical devices.