Ultralow-Leakage AlGaN/GaN High Electron Mobility Transistors on Si With Non-Alloyed Regrown Ohmic Contacts

Without employing gate dielectrics, AlGaN/GaN high-electron mobility transistors (HEMTs) on Si with non-alloyed regrown ohmic contacts exhibit record-low leakage currents ~10
^-12
A/mm, high ON/OFF current ratios 1011. Compared with HEMTs with conventional alloyed ohmic contacts, HEMTs with non-alloyed contacts show a reduction of 106 in leakage current, a steeper subthreshold slope, and 50% improvement in breakdown voltage. These observations indicate that avoiding high-temperature alloyed ohmic processes can lead to improved device performance.