High frequency microwave on-chip inductors using increased ferromagnetic resonance frequency of magnetic films

The fabrication and characterization of high frequency on-chip inductors using sputtered magnetic films with an improved frequency range is presented. Reducing the sputtering power in the deposition process was found to result in smoother film surfaces and stronger uniaxial magnetic anisotropy and increased the FMR of CoZrTaB from 1.48 GHz to 2.13 GHz. A magnetic-core, on-chip inductor was fabricated using the CoZrTaB films. Results have shown 150% higher inductance and a larger Q-factor up to 1.2 GHz as compared to an air-core inductor.