Novel LIM (Laser Induced Metallization) technologies of ITRI applied to 11 GHz high-gain microstrip array design on mobile phone casing

This article presents an integrated 11 GHz microstrip array antenna implemented by novel LIM (Laser Induced Metallization) technologies of ITRI. Through the proposed LIM technologies, the metal layouts of radiating patches, feeding network and antenna ground can be formed on surfaces of handset casing successfully with conformal and highly integrating characteristics. Compared to the well-known LDS technologies, the LIM technologies spray a special laser-activatable colloid on surface of supporter materials to replace prior metal-particle-mixed plastics of LDS for achieving more flexibility on substrate choosing in practical applications. The constructed prototype is discussed and analyzed in the paper.