Application of a plasma Arc lamp for thermal processing of semiconductor wafers

This paper describes the application of a vortex water wall high pressure argon lamp for a semiconductor annealing process. Precise control of the radiated power generated by the lamps is required which in turn requires an accurate electro-thermo-optical dynamic model of the lamp and opto-thermal model of the wafer. This paper discusses the modeling of the system comprised of the lamp and wafer.