Effect of deposition temperature on reactively sputtered CdS:O

Thin films of CdS and CdS:O were deposited using RF magnetron sputtering at room temperature and at 270 °C in sputtering ambient with 0-4% O
₂
(balance Ar). These films were characterized with respect to their optical and structural properties. The samples were then subjected to a heat treatment similar to that experienced during CdTe closed space sublimation deposition, after which the samples were re-characterized.