PDMS membranes with 2D PhC for LEDs far-field pattern modification

In this paper we present new imprinting process for fabrication of PhC structures on surface of thin PDMS membranes. We used interference lithography in combination with imprinting technique. 2D PhC surface relief structures of period 495 nm were patterned in thin PDMS membranes with depth up to 100 nm. Patterned PDMS membranes placed on different optoelectronic device surface could modify the final optical properties.