Prevention of convex corner undercutting in fabrication of silicon microcantilevers by wet anisotropic etching

This paper presents microcantilever fabrication on {100} oriented Si substrate using bulk micromachining technique. Detailed characteristics of convex corner compensation design for 〈100〉 oriented beam for two etching solutions: 25 wt. % TMAH and 30 wt. % KOH water solutions at 80 °C are given.