Multiplexed diode-laser sensor system for vapor-phase semiconductor wafer cleaning process monitoring

Summary form only given. Vapor-phase wafer cleaning processes offer the potential to decrease chemical usage and water consumption significantly over current liquid cleaning methods. However, the mechanisms responsible for oxide etch processes and the precise role of each species are not completely understood. This project aims to develop a unique multiplexed diode-laser absorption sensor system capable of in situ measurements of gas temperature and the concentrations of HF and H/sub 2/O to enhance process modeling and control. The sensor system employs three narrow-linewidth DFB tunable diode lasers operating at IR wavelengths.