Evaluation of p-stop structures in the n-side of n-on-n silicon strip detectors

A large area (63.6 mm/spl times/64 mm) n-on-n silicon strip detector was fabricated, implementing various p-stop structures in the n-side. The detectors were characterized in laboratory and in beam tests. The inter-strip capacitance showed features in which the individual p-stop structure had the longest tail toward saturation. The beam tests showed other p-stop structures collected more charge in the mid-strip region than the individual p-stop structure. In addition, there was a source which lost or spread charge and induced noise where the over-depletion was insufficient.