Multiple antiwear probes for stable and high throughput scanning probe microscope nanolithography

In this study, eight sets of multiscale patterns from 100 nm to tens of micrometers were successfully drawn in parallel within 30 min using our multiple antiwear probes. The total pixel number of each pattern set was 1000 × 500, corresponding to a drawing area of 100 μm × 50 μm and a drawing distance of 50 mm. Substantial improvements in the throughput, stability, and durability of scanning probe microscope lithography are demonstrated.