Application of EMMI contrast method in failure analysis

Photo emission microscope (EMMI) has been introduced in failure analysis of integrated circuits for a long time. By this technology, we can locate the failure site and confirm the failure mechanisms easily. However, there are considerable difficulties in determining test strategies and testability of fault localization when the circuit failed. In this paper, we proposed an EMMI contrast method in failure analysis of breakdown and current leakage. The contrast method mainly consists of I/V characteristic scan, quiescent bias testing and EMMI. Results indicate the method is efficient in ESD failure cases.