Surface structural variations of nanostructured porous silicon template formed electrochemically of current density parameter

Nanostructured porous silicon templates (NPSiT) were prepared by photo-electrochemical anodization of p-type crystalline silicon in HF electrolyte at different current density. Five samples were prepared with current densities varied from 5 to 40 minutes at 30 minutes of etching time. The porosity and thickness were measured using the gravimetric method. The surface roughness and topography of porous layers were investigated by atomic force microscopy. The surface roughness, porosity and thickness of porous layers monotonically increase with current densities. The optimum current density of NPSi prepared at optimum etching time (30 minutes) was obtained 20 mA/cm
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