Characterization of substrate anisotropy using substrate integrated waveguide technology

This paper presents an analysis of characterization of substrate material using substrate integrated waveguide (SIW) technology. The advantage of characterization of dielectric anisotropy using SIW technology is that the electric field of SIW exists only along the vertical direction (normal to the substrate surface). Then the permittivity measurement sensitivity of substrate material of SIW methods are compared with other planar-circuit methods, i.e., the stripline and coplanar waveguide (CPW) methods.