High throughput parallel micro and nano-scale replication - a low cost alternative for the fabrication of electronic-, optic- and microfluidic devices

Nanoimprint Lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometers down to a few nanometers. This paper describes a novel approach for the simultaneous imprinting of multiple polymer substrates simultaneously with multiple polymer stamps defining a new process modality called “Parallel Hot Embossing”. This technique is demonstrated on both bulk thermoplastic materials as well as on spin-on polymers. High-aspect ratio, micro-scale features - as needed for microfluidic lab-on-chip applications - as well as high resolution features down to sub 50 nm - that can be used as etching templates for plasmonic or photonic structuring - are demonstrated.