Femtosecond laser assisted multi-ion implantation in dielectrics

We report the simultaneous implantation of metal ions namely Te
⁴⁺
, Zn
²⁺
and Na
⁺
along with the rare-earth ion Er
³⁺
using a femtosecond laser ablation and deposition process. Planar waveguide structures with 1.3 μm deep uniform diffusion with a maximum refractive index change (Δn
max
) of 0.169 was produced in silica. This novel process will be explained using existing models with experimental verification. It has a potential to produce new materials and structures which are otherwise impossible to achieve via conventional glass and thin-film fabrication techniques. The unique possibility of diffusing rare earth ions opens new realm of photonic devices engineering.