Plasma properties of YBaCuO oxide films by rf facing targets magnetron sputtering

The optical emission of the rf facing targets magnetron sputtering (rf FTMS) plasma was analyzed to elucidate the sputtering process and the gas phase reaction. It is shown that oxygen content affects the amount of sputtered species. The resulting optimum conditions were found to be an rf power of 50 W, substrate position of 20 mm, total gas pressure of 60 mTorr, oxygen mixture ratio of 40%, and substrate temperature of 650/spl deg/C.