Contact improvement using E-beam and FIB deposited tungsten in carbon nanofiber interconnects

In a carbon nanofiber (CNF) interconnect device, electrode contacts formed by tungsten (W) deposition using focused ion beam is effective in reducing the contact resistance, but can potentially damage the test device because of its high energy. We present here a comparison of results for CNF interconnect devices with contacts formed by electron-beam-induced and focused-ion-beam-induced W depositions.