Study of plasma chemistry in plasma doping processes

Summary form only given. An empirical-analytic approach has been used for the plasma chemistry analysis of plasma ion implantation (PII) doping experiments. Least square (LS) fittings of SIMS profiles have been performed to find the relationship between gas, plasma, and dose compositions in multi-species plasmas and to optimize gas recipes and process conditions. A dynamic sheath model of the multi-species plasma has been used as a basic function for fitting. Good consistence between modeling and experiments for BF/sub 3/ and PH/sub 3/ PII doping processes was present. A PDP1 plasma simulation verified the results of the modeling.