Performance results of large field mix-match lithography

For an increasing number of semiconductor manufacturers, mix-and-match lithography has grown from a curiosity to an economic necessity. Significant cost of ownership savings can be derived from mix-and-match strategies maximizing the utilization of low to medium cost 1/spl times/ optical systems for imaging non-critical levels, while high cost reduction or e-beam systems are dedicated to critical levels. Paramount to successful mix-and-match strategy are the resolution and overlay registration of the 1/spl times/ tools. However, while much can be said about resolution, this discussion will focus on the overlay registration metric. More specifically, data will be presented which illustrates the overlay performance of Ultratech's new generation 1/spl times/ i-line stepper, the 2244i, to that of an SVGL Microscan reduction stepper.