The VIISion 80 and VIISion 200 ion implanter beam lines

The beam line design for Varian's VIISion high current ion implanters incorporates a number of significant features to enhance the generation and transport of ion beams with high efficiencies and minimal heavy metals and particle production. These include a dual filament ion source, a constant current extraction system with variable z axis and suppression voltage, a very high resolving power high acceptance mass analysis system, a rotating mass defining slit, a variable gap acceleration system and a full faraday in front of the wafer. This paper describes the architecture of both the 80 keV and 200 keV beam lines. Some of the novel beam line modules are discussed along with the performance of these systems.