Factors affecting the design of the Applied Materials xR80 implant family

This paper describes the assumptions made and solutions adopted by the xR80 design team in an attempt to optimise the overall cost performance ratio of the system, by design. The beamline design will be described in detail, together with the factors which increase low energy beam current transmission. New ion source and extraction technology have been key in producing high beam currents, concurrent with low maintenance intervals. To minimise the system footprint, several creative approaches have been taken in design of the beamline and also the handling system, particularly since the dimensional characteristics are to be maintained in the transition to 300 mm wafer size. These factors, together with the solutions adopted to maintain system maintainability will be described in detail in the paper.