A new VOx thin film for uncooled infrared focal plane arrays

In this paper, a new VO
_x
thin film for uncooled infrared focal plane arrays is proposed. The proposed VO
_x
thin film is fabricated with a magnetron sputtering method and has particular optical properties for infrared wavelength. The fabricating technology of the VO
_x
thin film has low-temperature characteristics and is completely compatible with the fabricating process of CMOS integrated circuits for uncooled infrared focal plane array. Experimentally measured results indicate that the fabricated VO
_x
thin film is potential to be applied as optical detecting materials for medium-wavelength infrared (MWIR) and long-wavelength infrared (LWIR).