Phase optimisation of PMN-PT thin films deposited by Pulsed Laser Deposition on MgO substrates and Pt-coated silicon

Stability and crystalline quality of PMN-PT (65/35) thin films deposited by Pulsed Laser Deposition on MgO <;001>; and MgO <;111>; are studied by X-Ray diffraction and Raman Scattering Spectroscopy. From these investigations, the stabilization of PMN-PT films on <;111>; Pt-coated silicon substrate is obtained by the integration of an oxide layer (La
_0.66
Sr
_0.33
MnO
₃
) on the Pt surface prior to the PMN-PT deposition. Physical properties are found to be very robust with a polarization up to 40μC/cm
²
for an electric field as high as 1MV/cm.