Ultra-thin-body PECVD Ge TFT low-voltage flash memory cell with high-k dielectrics for three-dimensional integration

In this study, we demonstrate the material and electrical characteristics of stackable Ge TFT flash memory cell with Al
₂
O
₃
high-k tunnel dielectric, metal NCs and (Ti,Dy)
_x
O
_y
control dielectric. Our proposed planar thin-film process is a simple batch process, and can therefore be used with relatively small cost increase.