Measurement of thickness and electrophysical parameters of nanometer films by means of optical and microwave methods

The possibility to determine the thickness and electrophysical parameters of thin nanometer dielectric and metal films in sandwich-like structures using the results of measurement of reflection and transmission spectra in microwave and optical band has been shown. The results of measurement of refractive index of SnO
₂
in the thicknesses range from 40 nm to 2.8 mkm and the results of measurement of conductivity of Cr-films applied to ceramic substrates are presented.