Solution deposition of amorphous IZO films by ultrasonic spray pyrolysis

Atmospheric-pressure solution deposition of the transparent conducting oxide (TCO), amorphous indium-zinc oxide (¿-IZO), was investigated as an alternative to traditional vacuum-based physical vapor deposition techniques for photovoltaic applications. Solution processing is attractive due to its ease and potential to lower device manufacturing costs. Here we report on ¿-IZO films prepared by ultrasonic spray pyrolysis from solutions of an indium-zinc formate (IZF) precursor. Thin, crack-free, amorphous IZO films with good optical transmittance (>75%) and conductivities of ~34 S/cm were produced from an IZF-HNO
₃
-methanol ink using joint RTP and Ar-H
₂
annealing.